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説明

APLB AHA BHA PHA Centella Mist Essence
An essence contains 23.8% AHA BHA PHA CEN that refreshing moisture recharge to dry skin.
Centella Asiatica Extract and Centella 3x Complex soothes and moisturizes sensitive skin from external environment.
A method of applying formulation technology that protects retinol ingredients to reach the skin and absorb the active ingredients safely.
Protect the skin from irritation with weak acidity close to healthy skin pH, cosmetic ingredient safety grade 1-2, and no fragrance contained.

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